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<title>Recent developments in spectroscopic ellipsometry for in-situ applications</title>
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2001
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Optical MaterialsEngineeringOptical TestingWindow BirefringenceOptical CharacterizationSpectroscopic PropertyOptical PropertiesInstrumentationOptical SpectroscopyCompound SemiconductorPhotometrySpectroscopic EllipsometryPolarization ImagingOptoelectronicsRotating-compensator TechnologySpectroscopyApplied PhysicsOptical System AnalysisSpectroscopic Method
The in situ measurement capabilities and advantages of recently developed spectroscopic ellipsometry (SE) instrumentation, which covers wide spectral ranges (190-1700 nm, or 0.73-6.5 eV) and is based on rotating-compensator technology, are described. A technique which can quantitatively correct for window birefringence is presented. Current in situ SE deposition monitoring and control applications in the compound semiconductor, display, and optical coatings industries are also presented.