Publication | Closed Access

Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O

Materials ScienceEngineeringProcess ParametersOxide ElectronicsSurface ScienceApplied PhysicsThin FilmsChemical DepositionChemical Vapor DepositionAtomic Layer DepositionZro2 Thin FilmsThin Film Processing