Journal of Synchrotron Radiation · 1998 · 17 citations · 2 references
Natural SciencesPhysicsBiomedical OpticsOptical MaterialsOpticsPhysical OpticsRay TracingExtreme Ultraviolet LithographyLens DesignMirror OpticsOptical Path Length
The design of front-end collimating optics for extreme-ultraviolet lithography (EUVL) is reported. For EUVL, collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror can achieve shorter optical path lengths than collimating optics consisting of two concave toroidal mirrors. Collimating optics consisting of a concave toroidal mirror and a convex toroidal mirror are discussed. The design of collimating optics for EUVL beamlines based on ray-tracing studies is described.
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