Plasma etching of refractory metals (W, Mo, Ta) and silicon in SF6 and SF6-O2. An analysis of the reaction products

Plasma etching of Si and SiO2 in SF6–O2 mixtures

Riccardo d’Agostino, Daniel Flamm · Journal of Applied Physics · 1981 · 272 citations

Natural Sciences, Materials Engineering, Materials Science +16

Dry Etching of Polyimide in  O 2 ‐  CF 4 and  O 2 ‐  SF 6 Plasmas

G. Turban, Michel Rapeaux · Journal of The Electrochemical Society · 1983 · 117 citations

Natural Sciences, Materials Engineering, Materials Science +17

Tungsten Etching in  CF 4 and  SF 6 Discharges

C.C. Tang, Dennis W. Hess · Journal of The Electrochemical Society · 1984 · 77 citations

Natural Sciences, Materials Science, Physics +17

The use of ?actinometer? gases in optical diagnostics of plasma etching mixtures: SF6-O2

Riccardo d’Agostino, V. Colaprico, F. Cramarossa · Plasma Chemistry and Plasma Processing · 1981 · 59 citations

Natural Sciences, Chemistry, Physics +12

Thermochemistry of the gaseous tungsten fluorides

D. L. Hildenbrand · The Journal of Chemical Physics · 1975 · 50 citations

Natural Sciences, Chemistry, Materials Science +13