Ion bombardment fabrication of optical waveguides using electron resist masks

Abstract

Fabrication of a circular strip waveguide by ion implantation of fused silica through a mask made by electron-beam exposure of polymethylmethacrylate (PMMA) is described. This technique has an advantage in its simplicity and the small number of processing steps involved. Guidance of 0.6328-μm light from a He–Ne laser through the guide is demonstrated.