Focused Ion Beam Patterning

Focused Ion Beam Patterning is a direct-write nanofabrication technique that uses a focused beam of ions to selectively sputter material from a thin film, enabling high-precision patterning at the nanoscale with localized milling capability.

1.2K

Publications

49.5K

Citations

4.6K

Authors

1K

Institutions

Publications per year

2017–2026

172

Variants

Fib Patterning

Authors

4.6K

  1. JG
    J. Giérak

    Centre National de la Recherche Scientifique, France

    24 publications · 837 citations

    18

    h-index

  2. JM
    J. Melngailis

    Massachusetts Institute of Technology, United States

    17 publications · 2.1K citations

    14

    h-index

  3. LR
    L. R. Harriott

    AT&T (United States), United States

    14 publications · 393 citations

    13

    h-index

  4. YW
    Yuh‐Lin Wang

    Institute of Atomic and Molecular Sciences, Academia Sinica, Taiwan

    13 publications · 483 citations

    12

    h-index

  5. LB
    L. Bischoff

    Helmholtz-Zentrum Dresden-Rossendorf, Germany

    15 publications · 358 citations

    12

    h-index

1–5 of 4.6K

Venues

  1. Applied Physics Letters

    105 publications · 3.9K citations

    36

    h-index

  2. 32

    h-index

  3. Nanotechnology

    59 publications · 2.6K citations

    27

    h-index

  4. Nano Letters

    29 publications · 2.5K citations

    23

    h-index

  5. 23

    h-index

1–5