Focused Ion Beam Patterning
Focused Ion Beam Patterning is a direct-write nanofabrication technique that uses a focused beam of ions to selectively sputter material from a thin film, enabling high-precision patterning at the nanoscale with localized milling capability.
1.2K
Publications
49.5K
Citations
4.6K
Authors
1K
Institutions
Publications per year
2017–2026
172
Variants
Fib Patterning
Parents
1.2K
Ion-beam sculpting at nanometre length scales
Jiali Li, Derek Stein, Ciaran J. McMullan et al. · Nature · 2001 · 1.7K citations · Full text
Planar Lenses Based on Nanoscale Slit Arrays in a Metallic Film
Lieven Verslegers, Peter B. Catrysse, Zongfu Yu et al. · Nano Letters · 2008 · 496 citations
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Institute of Atomic and Molecular Sciences, Academia Sinica, Taiwan
13 publications · 483 citations
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12
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1K

Centre National de la Recherche Scientifique
Paris, France
28 h-index
271 publications
9.6K citations
University of Cambridge
Cambridge, United Kingdom
18 h-index
82 publications
4.4K citations

Kyoto University
Kyoto, Japan
16 h-index
76 publications
2.4K citations

Helmholtz-Zentrum Dresden-Rossendorf
Dresden, Germany
16 h-index
76 publications
2K citations
Nanyang Technological University
Singapore, Singapore
16 h-index
63 publications
1.8K citations

Oak Ridge National Laboratory
Oak Ridge, United States
15 h-index
77 publications
3K citations
AT&T (United States)
Bedminster, United States
15 h-index
69 publications
1.8K citations
Raith (Germany)
Dortmund, Germany
15 h-index
56 publications
1.4K citations
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105 publications · 3.9K citations
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111 publications · 3.8K citations
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59 publications · 2.6K citations
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29 publications · 2.5K citations
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53 publications · 2.7K citations
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