Mechanisms of B deactivation control by F co-implantation

Abstract

Thermal annealing after preamorphization and solid-phase epitaxy of ultrashallow B implants leads to deactivation and diffusion driven by interstitials released from end-of-range defects. F inhibits these processes by forming small clusters that trap interstitials. A competing B–F interaction causes deactivation when F and B profiles overlap. Both pathways suppress B transient enhanced diffusion.