Concepedia

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TaCN growth with PDMAT and H2/Ar plasma by plasma enhanced atomic layer deposition

DOI

18

Citations

15

References

2010

Year

Qi Xie, Davy Deduytsche, Jan Musschoot, R.L. Van Meirhaeghe, Christophe Detavernier, Shao-Feng Ding, Xin-Ping Qu
Microelectronic Engineering

References

YearCitations

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