The effect of oxygen partial pressure on the properties of RF-sputtered Al2O3 thin films

<i>Glow Discharge Processes: Sputtering and Plasma Etching</i>

B. N. Chapman, J. L. Vossen · Physics Today · 1981 · 544 citations

Natural Sciences, Electrical Engineering, Physics +16

Glow discharge processes; Sputtering and plasma etching

C. M. Ferrar · IEEE Journal of Quantum Electronics · 1981 · 489 citations

Natural Sciences, Materials Engineering, Physics +14

Effect of Oxygen on the rf-Sputtering Rate of SiO2

Reese E. Jones, Harold F. Winters, L. I. Maissel · Journal of Vacuum Science and Technology · 1968 · 58 citations

Natural Sciences, Materials Engineering, Materials Science +10

Re-emission Coefficients of Si and SiO2 Films Deposited through rf and dc Sputtering

Reese E. Jones, C. L. Standley, L. I. Maissel · Journal of Applied Physics · 1967 · 38 citations

Engineering, Materials Engineering, Materials Science +15