Concepedia

C. L. Standley

CL

8

Publications

462

Citations

8

H-Index

1961

Active since

Affiliations

IBM (United States)(Current)

University of Arkansas at Fayetteville

C. L. Standley is an author at IBM (United States) specializing in materials science, engineering, and applied physics.

Top concepts

EngineeringMaterial ScienceApplied PhysicsSurface ScienceChemistryThin FilmsMicroelectronicsInorganic ChemistryElectrical EngineeringCrystallography

Publications per year

1961–1991

8

Publications

8

Application of Chemical Mechanical Polishing to the Fabrication of VLSI Circuit Interconnections

W. Patrick, W. L. Guthrie, C. L. Standley et al. · Journal of The Electrochemical Society · 1991 · 237 citations

Engineering, Mechanical Engineering, Silicon On Insulator +19

An X-Ray Diffraction Study of Aqueous Zinc Chloride Solutions

R. F. Kruh, C. L. Standley · Inorganic Chemistry · 1962 · 51 citations

Materials Science, Inorganic Chemistry, Chemical Engineering +14

Re-emission of Sputtered SiO[<sub>2</sub>] During Growth and Its Relation to Film Quality

L. I. Maissel, Reese E. Jones, C. L. Standley · IBM Journal of Research and Development · 1970 · 39 citations

Materials Science, Epitaxial Growth, Engineering +12

Re-emission Coefficients of Si and SiO2 Films Deposited through rf and dc Sputtering

Reese E. Jones, C. L. Standley, L. I. Maissel · Journal of Applied Physics · 1967 · 38 citations

Engineering, Integrated Circuits, Vacuum Device +18

On the Structure of Ferric Chloride Solutions

C. L. Standley, R. F. Kruh · The Journal of Chemical Physics · 1961 · 28 citations · Full text

Inorganic Chemistry, Ferromagnetism, Physics +4

Rows per page

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