Preparation of microcrystalline silicon films at ultra high-rate of 10 nm/s using high-density plasma

High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition

Lihui Guo, Michio Kondo, Makoto Fukawa et al. · Japanese Journal of Applied Physics · 1998 · 223 citations

Natural Sciences, Materials Engineering, Materials Science +17

Defect formation during growth of hydrogenated amorphous silicon

Gautam Ganguly, Akihisa Matsuda · Physical review. B, Condensed matter · 1993 · 167 citations

Natural Sciences, Materials Engineering, Materials Science +17

High rate growth of microcrystalline silicon using a high-pressure depletion method with VHF plasma

Makoto Fukawa, Susumu Suzuki, Lihui Guo et al. · Solar Energy Materials and Solar Cells · 2001 · 107 citations

Engineering, Materials Engineering, Materials Science +17

Microcrystalline materials and cells deposited by RF glow discharge

Michio Kondo · Solar Energy Materials and Solar Cells · 2003 · 92 citations

Natural Sciences, Materials Engineering, Materials Science +8