Makoto Fukawa - Concepedia

Concepedia

Author

Makoto Fukawa

Asahi Glass (Japan)

Also Known As

M Fukawa, M. Fukawa, Makoto FUKAWA, Makoto Fukawa, Mitarai, K.

29

Publications

1.3K

Citations

15

H-Index

24

Concepts

All Affiliations

Asahi Glass (Japan)Tokyo Institute of Technology Gifu University Asahi Glass (Belgium)

MF

About

Makoto Fukawa is an author at Asahi Glass (Japan) specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	14	15	1.3K
2	Applied Physics	11	12	893
3	Chemical Engineering	3	3	149
4	Electrical Engineering	3	3	172
5	Chemistry	1	1	263

Makoto Fukawa

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17

Publications

1.3K

Citations

14

H-Index

	Year	Citations
High rate growth of microcrystalline silicon at low temperatures Michio Kondo, Makoto Fukawa, Lihui Guo, Journal of Non-Crystalline Solids Materials ScienceEngineeringMicrofabricationCrystal Growth TechnologyApplied Physics	2000	294
Surface OH group governing adsorption properties of metal oxide films Satoshi Takeda, Makoto Fukawa, Yasuo Hayashi, Thin Solid Films Materials ScienceSurface Oh GroupEngineeringSurface ChemistryOxide Electronics	1999	263
High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition Lihui Guo, Michio Kondo, Makoto Fukawa, Japanese Journal of Applied Physics Materials ScienceHigh Rate DepositionEngineeringMicrofabricationApplied Physics	1998	223
High rate growth of microcrystalline silicon using a high-pressure depletion method with VHF plasma Makoto Fukawa, Susumu Suzuki, Lihui Guo, Solar Energy Materials and Solar Cells Materials EngineeringElectrical EngineeringEngineeringMicrofabricationNanoelectronics	2001	107
Role of the hydrogen plasma treatment in layer-by-layer deposition of microcrystalline silicon K. Saitoh, Michio Kondo, Makoto Fukawa, Applied Physics Letters Materials ScienceChemical EngineeringHydrogen Plasma TreatmentsEngineeringLayer-by-layer Deposition	1997	64
TiO2 thin films as protective material for transparent-conducting oxides used in Si thin film solar cells Hironori Natsuhara, Kouzou Matsumoto, Norimitsu Yoshida, Solar Energy Materials and Solar Cells Materials ScienceChemical EngineeringTransparent-conducting OxidesEngineeringOxide Electronics	2006	63
Role of surface OH groups in surface chemical properties of metal oxide films Satoshi Takeda, Makoto Fukawa Materials Science and Engineering B Materials ScienceSurface CharacterizationEngineeringSurface ChemistryCorrosion	2005	58
Improvement of a-Si solar cell properties by using SnO2:F TCO films coated with an ultra-thin TiO2 layer prepared by APCVD Mika Kambe, Makoto Fukawa, N. Taneda, Solar Energy Materials and Solar Cells Materials ScienceElectrical EngineeringEngineeringF Tco FilmsOxide Electronics	2006	49
Surface OH groups governing surface chemical properties of SiO2 thin films deposited by RF magnetron sputtering Satoshi Takeda, Makoto Fukawa Thin Solid Films Materials ScienceSurface CharacterizationEngineeringNanoelectronicsSurface Science	2003	36
Hydrogen-radical durability of TiO2 thin films for protecting transparent conducting oxide for Si thin film solar cells Hironori Natsuhara, Tatsuya Ōhashi, S.Y. Ogawa, Thin Solid Films Materials ScienceEngineeringOrganic Solar CellOxide ElectronicsApplied Physics	2003	31

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