Journal of Applied Physics · 2015 · 33 citations · 27 references
EngineeringMaterials EngineeringMaterials ScienceOptical MaterialsOptoelectronicsSemiconductor MaterialsDefects In Electronic MaterialsDopingIon ImplantationOptical Properties Of SemiconductorsOxide SemiconductorsSemiconductor DefectsInterstitialsIon Implantation EffectsOptical ActivityOptical CharacterizationOptical PropertiesPhotoluminescencePhotoluminescence SpectroscopyThermal Stability
The effects of annealing on the optical properties and defect/dopant evolution in wurtzite (0001) ZnO single crystals implanted with Er ions are studied using a combination of Rutherford backscattering/channeling spectrometry and photoluminescence measurements. The results suggest a lattice recovery behavior dependent on ion dose and involving formation/evolution of an anomalous multipeak defect distribution, thermal stability of optically active Er complexes, and Er outdiffusion. An intermediate defect band occurring between the surface and ion-induced defects in the bulk is stable up to 900 °C and has a photoluminescence signature around 420 nm well corresponding to Zn interstitials. The optical activity of the Er atoms reaches a maximum after annealing at 700 °C but is not directly associated to the ideal Zn site configuration, since the Er substitutional fraction is maximal already in the as-implanted state. In its turn, annealing at temperatures above 700 °C leads to dissociation of the optically active Er complexes with subsequent outdiffusion of Er accompanied by the efficient lattice recovery.
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GaN: Processing, defects, and devices
S. J. Pearton, J.C. Zolper, R. J. Shul et al. · Journal of Applied Physics · 1999 · 1.8K citations
Vacancy defect and defect cluster energetics in ion-implanted ZnO
Yufeng Dong, Filip Tuomisto, B. G. Svensson et al. · Physical Review B · 2010 · 131 citations · Full text