Substrate Polishing
Substrate Polishing is a surface refinement process within materials science that systematically removes surface irregularities and contaminants from a substrate through mechanical, chemical, or electrochemical means to achieve a highly smooth and defect-free surface essential for subsequent thin-film deposition or microfabrication processes.
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2.2K
Citations
330
Authors
112
Institutions
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2017–2026
27
Parents
76
Chemical polishing of bulk and epitaxial GaN
J.L. Weyher, S. Müller, I. Grzegory et al. · Journal of Crystal Growth · 1997 · 172 citations
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Singapore Institute of Manufacturing Technology
Singapore, Singapore
5 h-index
9 publications
279 citations
Huaqiao University
Xiamen, China
4 h-index
18 publications
483 citations
Nanyang Technological University
Singapore, Singapore
4 h-index
7 publications
219 citations
Pusan National University
Busan, South Korea
4 h-index
13 publications
235 citations
Tsinghua University
Beijing, China
4 h-index
14 publications
794 citations
The University of Osaka
Osaka, Japan
3 h-index
14 publications
351 citations

Kumamoto University
Kumamoto, Japan
3 h-index
10 publications
552 citations

National Institute of Advanced Industrial Science and Technology
Tsukuba, Japan
2 h-index
3 publications
58 citations
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6 publications · 272 citations
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5 publications · 78 citations
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4 publications · 78 citations
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4 publications · 106 citations
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3 publications · 53 citations
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