Substrate Polishing

Substrate Polishing is a surface refinement process within materials science that systematically removes surface irregularities and contaminants from a substrate through mechanical, chemical, or electrochemical means to achieve a highly smooth and defect-free surface essential for subsequent thin-film deposition or microfabrication processes.

76

Publications

2.2K

Citations

330

Authors

112

Institutions

Publications per year

2017–2026

27

Authors

330

  1. YT
    Yebing Tian

    Shandong University of Technology, China

    4 publications · 128 citations

    4

    h-index

  2. ZZ
    Z.W. Zhong

    Nanyang Technological University, Singapore

    4 publications · 128 citations

    4

    h-index

  3. JL
    Jing Lü

    Huaqiao University, China

    4 publications · 115 citations

    4

    h-index

  4. YJ
    Y. J. Ang

    Singapore Institute of Manufacturing Technology, Singapore

    3 publications · 103 citations

    3

    h-index

  5. XX
    Xiaoming Xu

    Center for Drug Evaluation and Research, United States

    3 publications · 95 citations

    3

    h-index

1–5 of 330

Venues

  1. Diamond and Related Materials

    6 publications · 272 citations

    6

    h-index

  2. 5

    h-index

  3. Precision Engineering

    4 publications · 78 citations

    4

    h-index

  4. 4

    h-index

  5. Applied Physics Letters

    3 publications · 53 citations

    3

    h-index

1–5