Substrate Lapping

Substrate Lapping is a precision surface preparation technique that belongs to the class of substrate preparation methods, distinguished by its use of abrasive action between a rotating lap and the substrate to achieve fine surface planarization and controlled material removal at the micro- to nanoscale level.

25

Publications

937

Citations

98

Authors

31

Institutions

Publications per year

2017–2026

9

Authors

98

  1. BP
    Bo Pan

    Dalian University of Technology, China

    2 publications · 81 citations

    2

    h-index

  2. KI
    Kouji Inagaki

    The University of Osaka, Japan

    2 publications · 35 citations

    2

    h-index

  3. KA
    Kenta Arima

    The University of Osaka, Japan

    2 publications · 35 citations

    2

    h-index

  4. HK
    Hyuk-Min Kim

    Hanyang University, South Korea

    2 publications · 136 citations

    2

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  5. RM
    R. Manivannan

    National Institute of Technology Raipur, India

    2 publications · 136 citations

    2

    h-index

1–5 of 98

Venues

  1. Wear

    4 publications · 218 citations

    4

    h-index

  2. Journal of Materials Processing Technology

    3 publications · 273 citations

    3

    h-index

  3. 2

    h-index

  4. CIRP Annals

    2 publications · 51 citations

    2

    h-index

  5. 2

    h-index

1–5