Sub-10 Nanometer Patterning

Sub-10 Nanometer Patterning is a nanofabrication technique that enables the creation of physical features smaller than 10 nanometers, distinguishing itself by achieving resolution at the atomic scale necessary for advanced semiconductor and nanoscale device manufacturing.

99

Publications

9.1K

Citations

546

Authors

184

Institutions

Publications per year

2017–2026

31

Authors

546

  1. MS
    Mohammad S. M. Saifullah

    Institute of Materials Research and Engineering, Singapore

    4 publications · 83 citations

    4

    h-index

  2. JK
    Joel K. W. Yang

    Singapore University of Technology and Design, Singapore

    4 publications · 249 citations

    4

    h-index

  3. SY
    Stephen Y. Chou

    Princeton University, United States

    3 publications · 2.4K citations

    3

    h-index

  4. SM
    S. Matsui

    NEC (Japan), Japan

    3 publications · 348 citations

    3

    h-index

  5. ME
    Mark E. Welland

    University of Cambridge, United Kingdom

    3 publications · 71 citations

    3

    h-index

1–5 of 546

Venues

  1. 8

    h-index

  2. 8

    h-index

  3. Nanotechnology

    8 publications · 379 citations

    8

    h-index

  4. Microelectronic Engineering

    7 publications · 298 citations

    7

    h-index

  5. Nano Letters

    5 publications · 288 citations

    5

    h-index

1–5