S. Matsui

Ultrahigh resolution of calixarene negative resist in electron beam lithography

Jun‐ichi Fujita, Y. Ohnishi, Yukinori Ochiai et al. · Applied Physics Letters · 1996 · 242 citations

Engineering, Electron-beam Lithography, Microscopy +16

Enhancement of breakdown voltage by AlN buffer layer thickness in AlGaN∕GaN high-electron-mobility transistors on 4in. diameter silicon

S. Arulkumaran, Takashi Egawa, S. Matsui et al. · Applied Physics Letters · 2005 · 115 citations

Materials Engineering, Layer Thickness, Electrical Engineering +15

Manipulation of an atomic beam by a computer-generated hologram

Jun‐ichi Fujita, Makoto Morinaga, T. Kishimoto et al. · Nature · 1996 · 79 citations

Photonics, Holography, Engineering +10

Development of three-dimensional pattern-generating system for focused-ion-beam chemical-vapor deposition

Takayuki Hoshino, Keiichiro Watanabe, Reo Kometani et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 73 citations

Engineering, Electron-beam Lithography, Computer-aided Design +18

Focused ion beam-induced fabrication of tungsten structures

M. Ishida, Jun‐ichi Fujita, T. Ichihashi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 72 citations

Materials Engineering, Materials Science, Heat Treatment +14