Ultrahigh resolution of calixarene negative resist in electron beam lithography

Jun‐ichi Fujita, Y. Ohnishi, Yukinori Ochiai, +1

Applied Physics Letters

EngineeringElectron-beam LithographyMicroscopyElectron DiffractionElectron Optic +14

Enhancement of breakdown voltage by AlN buffer layer thickness in AlGaN∕GaN high-electron-mobility transistors on 4in. diameter silicon

S. Arulkumaran, Takashi Egawa, S. Matsui, +1

Applied Physics Letters

Materials EngineeringLayer ThicknessElectrical EngineeringWide-bandgap SemiconductorEngineering +13

Manipulation of an atomic beam by a computer-generated hologram

Jun‐ichi Fujita, Makoto Morinaga, T. Kishimoto, +3

Nature

PhotonicsHolographyEngineeringBeam OpticPhysics +8

Development of three-dimensional pattern-generating system for focused-ion-beam chemical-vapor deposition

Takayuki Hoshino, Keiichiro Watanabe, Reo Kometani, +8

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringElectron-beam LithographyComputer-aided DesignComputational FabricationStructural Materials +16

Focused ion beam-induced fabrication of tungsten structures

M. Ishida, Jun‐ichi Fujita, T. Ichihashi, +3

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Materials EngineeringMaterials ScienceHeat TreatmentIon ImplantationEngineering +12

Reactive ion beam etching of Y-Ba-Cu-O superconductors

S. Matsui, N. Takado, H. Tsuge, +1

Applied Physics Letters

Materials ScienceSuperconducting MaterialElectrical EngineeringHigh-tc SuperconductivityEngineering +10

Nanometer-scale resolution of calixarene negative resist in electron beam lithography

Jun‐ichi Fujita, Y. Ohnishi, Yukinori Ochiai, +2

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringElectron-beam LithographyMicroscopyOptoelectronic DevicesChemistry +23

Nanostructure fabrication using electron beam and its application to nanometer devices

S. Matsui

Proceedings of the IEEE

Eb LithographyEngineeringElectron-beam LithographyBeam LithographyNanoelectronics +16

Nanofabrication toward sub-10 nm and its application to novel nanodevices

J. Sone, Jun‐ichi Fujita, Yukinori Ochiai, +9

Nanotechnology

Sub-10 NmEngineeringElectron-beam LithographyNanodevicesPattern Transfer +19

Nanoimprint using three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition

Keiichiro Watanabe, T. Morita, Reo Kometani, +10

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringBiofabricationPmma ReversalBeam LithographyMaterials Fabrication +15