Concepedia

Self-aligned Processes

Self-Aligned Processes is a fabrication methodology in semiconductor manufacturing that belongs to the class of patterning techniques and is distinguished by its inherent alignment of successive material layers or features through a common, automatically registered process sequence, thereby eliminating the need for external alignment markers or overlay lithography.

180

Publications

6.5K

Citations

911

Authors

195

Institutions

Publications per year

2017–2026

21

Parents

Publications

180

Microstructured magnetic tunnel junctions (invited)

W. J. Gallagher, S. Parkin, Yu Lu et al. · Journal of Applied Physics · 1997 · 449 citations

, , +17

SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures

K.A. Shaw, Z. Lisa Zhang, Noel C. MacDonald · Sensors and Actuators A Physical · 1994 · 270 citations · Full text

, , +17

N-polar GaN epitaxy and high electron mobility transistors

Man Hoi Wong, S. Keller, Sansaptak Dasgupta Nidhi et al. · Semiconductor Science and Technology · 2013 · 228 citations · Full text

, , +17

Low threshold planarized vertical-cavity surface-emitting lasers

R.S. Geels, S. Corzine, J.W. Scott et al. · IEEE Photonics Technology Letters · 1990 · 184 citations

, , +17

Electrically-pumped compact hybrid silicon microring lasers for optical interconnects

Di Liang, Marco Fiorentino, Tadashi Okumura et al. · Optics Express · 2009 · 172 citations · Full text

, , +16

1–5 of 180

Authors

911

  1. SK
    S. Konaka

    NTT Basic Research Laboratories, Japan

    6 publications · 312 citations

    6

    h-index

  2. MS
    Masao Suzuki

    NOF Corporation (Japan), Japan

    4 publications · 192 citations

    4

    h-index

  3. JL
    Jianqiang Lin

    Massachusetts Institute of Technology, United States

    4 publications · 128 citations

    4

    h-index

  4. TS
    T. Sakai

    NTT Basic Research Laboratories, Japan

    4 publications · 172 citations

    4

    h-index

  5. SN
    Sakurako Natori

    Tokyo Electron (Japan), Japan

    3 publications · 48 citations

    3

    h-index

1–5 of 911

Institutions

195

  1. NTT Basic Research Laboratories

    Atsugi, Japan

    9 h-index

    28 publications

    864 citations

  2. Fujitsu (Japan)

    Kawasaki, Japan

    8 h-index

    32 publications

    1.3K citations

  3. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    7 h-index

    32 publications

    3.1K citations

  4. Massachusetts Institute of Technology

    Cambridge, United States

    7 h-index

    32 publications

    827 citations

  5. University of California, Santa Barbara

    Santa Barbara, United States

    5 h-index

    33 publications

    5.2K citations

  6. IBM (United States)

    Armonk, United States

    5 h-index

    31 publications

    939 citations

  7. NTT (Japan)

    Tokyo, Japan

    4 h-index

    15 publications

    451 citations

  8. The University of Tokyo

    Tokyo, Japan

    4 h-index

    14 publications

    278 citations

1–8 of 195

Venues

  1. IEEE Transactions on Electron Devices

    21 publications · 845 citations

    16

    h-index

  2. IEEE Electron Device Letters

    17 publications · 580 citations

    15

    h-index

  3. Applied Physics Letters

    13 publications · 466 citations

    11

    h-index

  4. 10

    h-index

  5. IEEE Journal of Solid-State Circuits

    7 publications · 214 citations

    7

    h-index

1–5