K.A. Shaw

SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures

K.A. Shaw, Z.Lisa Zhang, Noel C. MacDonald · Sensors and Actuators A Physical · 1994 · 269 citations · Full text

Engineering, Single-crystal Silicon, Single Lithography Step +23

Independent tuning of linear and nonlinear stiffness coefficients [actuators]

Scott G. Adams, F.M. Bertsch, K.A. Shaw et al. · Journal of Microelectromechanical Systems · 1998 · 94 citations

Engineering, Mechanical Engineering, Biomedical Engineering +19

Capacitance based tunable resonators

Scott G. Adams, F.M. Bertsch, K.A. Shaw et al. · Journal of Micromechanics and Microengineering · 1998 · 69 citations

Bistable State, Engineering, Mechanical Engineering +17

SCREAM I: A single mask, single-crystal silicon process for microelectromechanical structures

K.A. Shaw, Z.L. Zhang, Noel C. MacDonald · 2002 · 51 citations

Engineering, Process Outline, Electron-beam Lithography +22

Capacitance Based Tunable Micromechanical Resonators

Scott G. Adams, F.M. Bertsch, K.A. Shaw et al. · Proceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95 · 2005 · 38 citations

Resonant Oscillations, Engineering, Tunable Micromechanical Resonators +13