Concepedia

Photomask Layout

Photomask Layout is a specialized geometric design representing the pattern of an integrated circuit layer, serving as a photolithographic template in semiconductor manufacturing to selectively transmit or block light during wafer fabrication.

22

Publications

569

Citations

79

Authors

25

Institutions

Publications per year

2017–2026

2

Variants

Mask Layout

Parents

Publications

22

Inverse Lithography Technology (ILT): what is the impact to the photomask industry?

Linyong Pang, Yong Liu, Dan Abrams · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 82 citations

, , +13

Robust level-set-based inverse lithography

Yijiang Shen, Ningning Jia, Ngai Wong et al. · Optics Express · 2011 · 75 citations · Full text

, , +17

Open source hardware for instrumentation and measurement

C. K. Harnett · IEEE Instrumentation & Measurement Magazine · 2011 · 49 citations

, , +12

From IC Layout to Die Photograph: A CNN-Based Data-Driven Approach

Hao-Chiang Shao, Chao-Yi Peng, Jun-Rei Wu et al. · IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems · 2020 · 37 citations · Full text

, , +17

A new IGBT with a monolithic over-current protection circuit

Y. Seki, Yoshihisa Harada, Noriyuki Iwamuro et al. · 2002 · 35 citations

, , +15

1–5 of 22

Authors

79

  1. TJ
    Thomas J. Russell

    National Institute of Standards and Technology, United States

    1 publications · 23 citations

    1

    h-index

  2. NW
    Ngai Wong

    University of Hong Kong, Hong Kong SAR China

    1 publications · 75 citations

    1

    h-index

  3. RL
    Roman Liebe

    Advanced Mask Technology Center (Germany), Germany

    1 publications · 11 citations

    1

    h-index

  4. RL
    R. L. Mattis

    National Institute of Standards and Technology, United States

    1 publications · 23 citations

    1

    h-index

  5. AC
    Alexander C. Diener

    Technische Universität Braunschweig, Germany

    1 publications · 11 citations

    1

    h-index

1–5 of 79

Institutions

25

  1. National Institute of Standards and Technology

    Gaithersburg, United States

    2 h-index

    6 publications

    129 citations

  2. HTC (Taiwan)

    Banqiao District, Taiwan

    1 h-index

    1 publications

    37 citations

  3. National Yang Ming Chiao Tung University

    Hsinchu, Taiwan

    1 h-index

    1 publications

    11 citations

  4. University of California, Los Angeles

    Los Angeles, United States

    1 h-index

    3 publications

    66 citations

  5. Fu Jen Catholic University

    Taipei, Taiwan

    1 h-index

    1 publications

    37 citations

  6. MIT Lincoln Laboratory

    Lexington, United States

    1 h-index

    1 publications

    14 citations

  7. IBM Research - Almaden

    San Jose, United States

    1 h-index

    6 publications

    168 citations

  8. University of California, Berkeley

    Berkeley, United States

    1 h-index

    2 publications

    44 citations

1–8 of 25

Venues

  1. 5

    h-index

  2. 1

    h-index

  3. Optical Microlithography XVIII

    1 publications · 10 citations

    1

    h-index

  4. IEEE Journal of Solid-State Circuits

    1 publications · 14 citations

    1

    h-index

  5. 1

    h-index

1–5