Oxidation Annealing
Oxidation Annealing is a thermal processing method in which a thin film is subjected to controlled high-temperature exposure in an oxidizing environment to promote the growth of a stoichiometric oxide layer, thereby enhancing crystallinity, interfacial stability, and electrical properties of the film.
102
Publications
4.3K
Citations
413
Authors
137
Institutions
Publications per year
2017–2026
16
Parents
102
Band gap narrowing of titanium dioxide by sulfur doping
T. Umebayashi, Tetsuya Yamaki, H. Itoh et al. · Applied Physics Letters · 2002 · 1.4K citations
1–5 of 102
413
National Institute of Advanced Industrial Science and Technology, Japan
7 publications · 215 citations
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National Institute of Advanced Industrial Science and Technology, Japan
6 publications · 177 citations
6
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5
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National Institute of Advanced Industrial Science and Technology, Japan
5 publications · 124 citations
5
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National Institute of Advanced Industrial Science and Technology, Japan
4 publications · 97 citations
4
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1–5 of 413
137

National Institute of Advanced Industrial Science and Technology
Tsukuba, Japan
11 h-index
61 publications
1.6K citations
Pohang University of Science and Technology
Pohang, South Korea
6 h-index
16 publications
597 citations

Centre National de la Recherche Scientifique
Paris, France
3 h-index
7 publications
178 citations
University of Tsukuba
Tsukuba, Japan
3 h-index
7 publications
114 citations

Hong Kong Polytechnic University
Hong Kong, Hong Kong
2 h-index
2 publications
106 citations
Seoul National University
Seoul, South Korea
2 h-index
12 publications
434 citations
Institute of Science and Technology
Kathmandu, Nepal
2 h-index
4 publications
118 citations

City University of Hong Kong
Hong Kong, Hong Kong
2 h-index
3 publications
115 citations
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14 publications · 1.8K citations
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MSF · Book series · 11 publications · 225 citations
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7 publications · 199 citations
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7 publications · 262 citations
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JES · 5 publications · 316 citations
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