Oxidation Annealing

Oxidation Annealing is a thermal processing method in which a thin film is subjected to controlled high-temperature exposure in an oxidizing environment to promote the growth of a stoichiometric oxide layer, thereby enhancing crystallinity, interfacial stability, and electrical properties of the film.

102

Publications

4.3K

Citations

413

Authors

137

Institutions

Publications per year

2017–2026

16

Authors

413

  1. KF
    Kenji Fukuda

    National Institute of Advanced Industrial Science and Technology, Japan

    7 publications · 215 citations

    7

    h-index

  2. JS
    Junji Senzaki

    National Institute of Advanced Industrial Science and Technology, Japan

    6 publications · 177 citations

    6

    h-index

  3. JL
    Jong‐Lam Lee

    Pohang University of Science and Technology, South Korea

    5 publications · 181 citations

    5

    h-index

  4. SH
    Shinsuke Harada

    National Institute of Advanced Industrial Science and Technology, Japan

    5 publications · 124 citations

    5

    h-index

  5. KA
    Kazuo Arai

    National Institute of Advanced Industrial Science and Technology, Japan

    4 publications · 97 citations

    4

    h-index

1–5 of 413

Venues

  1. Applied Physics Letters

    14 publications · 1.8K citations

    14

    h-index

  2. Materials science forum

    MSF · Book series · 11 publications · 225 citations

    11

    h-index

  3. Journal of Applied Physics

    7 publications · 199 citations

    7

    h-index

  4. IEEE Electron Device Letters

    7 publications · 262 citations

    7

    h-index

  5. Journal of The Electrochemical Society

    JES · 5 publications · 316 citations

    5

    h-index

1–5