Concepedia

Optical Proximity Correction

Optical Proximity Correction is a computational lithography technique used in mask design that modifies the mask pattern to compensate for optical distortions and process effects during semiconductor fabrication, thereby improving the fidelity of the printed features on the wafer.

271

Publications

7.5K

Citations

968

Authors

167

Institutions

Publications per year

2017–2026

35

Variants

Opc

Parents

Publications

271

Mask Design for Optical Microlithography—An Inverse Imaging Problem

Amyn Poonawala, Peyman Milanfar · IEEE Transactions on Image Processing · 2007 · 216 citations

, , +16

Fast optical and process proximity correction algorithms for integrated circuit manufacturing

Nicolas B. Cobb, Avideh Zakhor · 1998 · 183 citations

, , +13

Level-specific lithography optimization for 1-Gb DRAM

Alfred K. K. Wong, Richard A. Ferguson, Scott Mansfield et al. · IEEE Transactions on Semiconductor Manufacturing · 2000 · 109 citations

, , +15

Projection optical lithography

M. Rothschild · Materials Today · 2005 · 105 citations · Full text

, , +13

<title>Mathematical and CAD framework for proximity correction</title>

Nicolas B. Cobb, Avideh Zakhor, Eugene A. Miloslavsky · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1996 · 99 citations

, , +15

1–5 of 271

Authors

968

  1. XM
    Xu Ma

    Beijing Institute of Technology, China

    16 publications · 654 citations

    15

    h-index

  2. BY
    Bei Yu

    Chinese University of Hong Kong, Hong Kong SAR China

    14 publications · 582 citations

    13

    h-index

  3. GR
    Gonzalo R. Arce

    University of Delaware, United States

    12 publications · 508 citations

    12

    h-index

  4. DZ
    David Z. Pan

    The University of Texas at Austin, United States

    12 publications · 371 citations

    11

    h-index

  5. YM
    Yuzhe Ma

    Chinese University of Hong Kong, Hong Kong SAR China

    10 publications · 425 citations

    10

    h-index

1–5 of 968

Institutions

167

  1. IBM (United States)

    Armonk, United States

    14 h-index

    95 publications

    2.8K citations

  2. The University of Texas at Austin

    Austin, United States

    14 h-index

    39 publications

    1.2K citations

  3. Beijing Institute of Technology

    Beijing, China

    13 h-index

    43 publications

    1.2K citations

  4. Chinese University of Hong Kong

    Hong Kong, Hong Kong

    11 h-index

    41 publications

    1.7K citations

  5. Toshiba (Japan)

    Tokyo, Japan

    11 h-index

    43 publications

    859 citations

  6. University of California, Berkeley

    Berkeley, United States

    11 h-index

    24 publications

    914 citations

  7. University of California San Diego

    San Diego, United States

    10 h-index

    22 publications

    484 citations

  8. IMEC

    Leuven, Belgium

    10 h-index

    29 publications

    691 citations

1–8 of 167

Venues

  1. 27

    h-index

  2. 15

    h-index

  3. Journal of Micro/Nanolithography MEMS and MOEMS

    27 publications · 565 citations

    14

    h-index

  4. 11

    h-index

  5. Optics Express

    10 publications · 492 citations

    10

    h-index

1–5