Scott Mansfield - Concepedia

Author

Scott Mansfield

IBM (United States)

Also Known As

S Mansfield, S. M. Mansfield, S. Mansfield, S.M. Mansfield, Scott M. Mansfield, Scott Mansfield

Publications

1.4K

Citations

H-Index

Concepts

All Affiliations

IBM (United States)Stanford University

About

Scott Mansfield is an author at IBM (United States) specializing in engineering, microelectronics, and computer engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	15	1.3K
2	Medicine	2	2	697
3	Business	1	1	30
4	Health Sciences	1	1	15
5	Natural Sciences	1	1	10

Scott Mansfield

Publications

1.3K

Citations

H-Index

Page 1

	Year	Citations
Solid immersion microscope Scott Mansfield, G. S. Kino Applied Physics Letters EngineeringMicroscopyNew TypeBiomedical EngineeringMicroscopy Method	1990	663
High-numerical-aperture lens system for optical storage Scott Mansfield, W. R. Studenmund, G. S. Kino, Optics Letters PhotonicsOptical MaterialsOrganic PhotonicsEngineeringOphthalmology	1993	162
Level-specific lithography optimization for 1-Gb DRAM Alfred K. K. Wong, Richard A. Ferguson, Scott Mansfield, IEEE Transactions on Semiconductor Manufacturing Level-specific Lithography OptimizationPhysical Design (Electronics)Wafer Scale ProcessingEngineeringElectron-beam Lithography	2000	108
TCAD development for lithography resolution enhancement Lars W. Liebmann, Scott Mansfield, Alfred K. K. Wong, IBM Journal of Research and Development Wafer Scale ProcessingEngineeringVlsi DesignBeam LithographyMicroscopy	2001	74
Reducing DfM to practice: the lithography manufacturability assessor Lars W. Liebmann, Scott Mansfield, Geng Han, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringIndustrial EngineeringDigital ManufacturingDimensioning And TolerancingLithography Component	2006	40
Lithographic effects of mask critical dimension error Alfred K. K. Wong, Richard A. Ferguson, Lars W. Liebmann, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyOptic DesignOptical Testing	1998	34
Process window OPC for reduced process variability and enhanced yield Azalia A. Krasnoperova, James Culp, Ioana Graur, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyEnergy EfficiencyOptical ComputingWafer Scale Processing	2006	30
Optimizing style options for subresolution assist features Lars W. Liebmann, James A. Bruce, W. H. Chu, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Sraf Style OptionsEngineeringElectronic Design AutomationElectronic DesignComputer-aided Design	2001	30
The mask error factor in optical lithography Alfred K. K. Wong, Richard A. Ferguson, Scott Mansfield IEEE Transactions on Semiconductor Manufacturing Image IntegrityLithography StrategiesOptical MaterialsImage AnalysisEngineering	2000	29
Lithographic comparison of assist feature design strategies Scott Mansfield, Lars W. Liebmann, Antoinette F. Molless, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyOptic DesignComputer-aided DesignComputational Illumination	2000	28

Page 1