Mask Coating Materials

Mask Coating Materials is a specialized class of photoresist and deposition materials used in semiconductor lithography that selectively adhere to mask substrates to enable precise pattern transfer by differentially transmitting or blocking radiation during integrated circuit fabrication.

15

Publications

478

Citations

79

Authors

28

Institutions

Publications per year

2017–2026

5

Authors

79

  1. ZH
    Zane Hartzog

    Auburn University, United States

    2 publications · 148 citations

    2

    h-index

  2. DJ
    David J. Elton

    Auburn University, United States

    2 publications · 148 citations

    2

    h-index

  3. AR
    Aditi Rane

    Auburn University, United States

    2 publications · 148 citations

    2

    h-index

  4. ME
    Michael E. Baginski

    Auburn University, United States

    2 publications · 148 citations

    2

    h-index

  5. RN
    Robert N. Dean

    Auburn University, United States

    2 publications · 148 citations

    2

    h-index

1–5 of 79

Venues

  1. Thin Solid Films

    2 publications · 37 citations

    2

    h-index

  2. IBM Journal of Research and Development

    1 publications · 60 citations

    1

    h-index

  3. 1

    h-index

  4. 1

    h-index

  5. Applied Surface Science

    1 publications · 13 citations

    1

    h-index

1–5