Mask Coating Materials
Mask Coating Materials is a specialized class of photoresist and deposition materials used in semiconductor lithography that selectively adhere to mask substrates to enable precise pattern transfer by differentially transmitting or blocking radiation during integrated circuit fabrication.
15
Publications
478
Citations
79
Authors
28
Institutions
Publications per year
2017–2026
5
Parents
15
Yan Dong, Yanan Zou, Xiang Li et al. · Applied Energy · 2023 · 65 citations
Review of technology for 157-nm lithography
A. K. Bates, M. Rothschild, T. M. Bloomstein et al. · IBM Journal of Research and Development · 2001 · 60 citations
1–5 of 15
79
2
h-index
2
h-index
2
h-index
2
h-index
2
h-index
1–5 of 79
28
Auburn University
Auburn, United States
2 h-index
11 publications
869 citations
Bahauddin Zakariya University
Multan, Pakistan
1 h-index
4 publications
48 citations

Universidade Estadual de Campinas (UNICAMP)
Campinas, Brazil
1 h-index
2 publications
26 citations

University of Huddersfield
Huddersfield, United Kingdom
1 h-index
2 publications
24 citations
Osipyan Institute of Solid State Physics RAS
Chernogolovka, Russia
1 h-index
2 publications
34 citations
JEOL (United States)
Peabody, United States
1 h-index
1 publications
29 citations
University of Southern California
Los Angeles, United States
1 h-index
2 publications
24 citations

Nagoya Institute of Technology
Nagoya, Japan
1 h-index
1 publications
12 citations
1–8 of 28
2 publications · 37 citations
2
h-index
1 publications · 60 citations
1
h-index
1 publications · 16 citations
1
h-index
1 publications · 129 citations
1
h-index
1 publications · 13 citations
1
h-index
1–5