Low-temperature Bonding

Low-Temperature Bonding is a wafer bonding technique that belongs to the class of direct bonding methods and is distinguished by its execution at temperatures significantly below 400 °C, enabling minimal thermal budget and compatibility with temperature-sensitive materials and integrated circuit processing.

618

Publications

24.5K

Citations

2.1K

Authors

448

Institutions

Publications per year

2017–2026

169

Authors

2.1K

  1. KC
    Kuan‐Neng Chen

    National Yang Ming Chiao Tung University, Taiwan

    32 publications · 2K citations

    23

    h-index

  2. TS
    Tadatomo Suga

    The University of Tokyo, Japan

    39 publications · 1.4K citations

    23

    h-index

  3. EH
    Eiji Higurashi

    The University of Tokyo, Japan

    17 publications · 516 citations

    15

    h-index

  4. CS
    Chuan Seng Tan

    Nanyang Technological University, Singapore

    19 publications · 714 citations

    14

    h-index

  5. CW
    Chenxi Wang

    Harbin Institute of Technology, China

    14 publications · 641 citations

    14

    h-index

1–5 of 2.1K

Venues

  1. Applied Physics Letters

    32 publications · 1.2K citations

    23

    h-index

  2. Journal of Micromechanics and Microengineering

    JMM · 29 publications · 2K citations

    23

    h-index

  3. Sensors and Actuators A Physical

    25 publications · 1.5K citations

    19

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 20 publications · 523 citations

    15

    h-index

  5. Applied Surface Science

    14 publications · 513 citations

    14

    h-index

1–5