Concepedia

Line Etching

Line Etching is an intaglio printing technique in which a metal plate is coated with an acid-resistant ground, selectively incised to expose lines, and then chemically etched with acid to create recessed channels that hold ink for transferring a printed image.

7

Publications

245

Citations

28

Authors

9

Institutions

Publications per year

2017–2026

0

Parents

Publications

7

Simulation of reactive ion etching pattern transfer

Eric S. G. Shaqfeh, C. W. Jurgensen · Journal of Applied Physics · 1989 · 117 citations

, , +17

Digital etching study and fabrication of fine Si lines and dots

Jiro Yamamoto, Takashi Kawasaki, Hiroyuki Sakaue et al. · Thin Solid Films · 1993 · 33 citations

, , +14

GaAs and AlGaAs crystallographic etching with low-pressure chlorine radicals in an ultrahigh-vacuum system

Sumio Sugata, Kiyoshi Asakawa · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1987 · 32 citations

, , +16

Prediction of multiple-feature effects in plasma etching

Gyeong S. Hwang, Konstantinos P. Giapis · Applied Physics Letters · 1997 · 24 citations · Full text

, , +16

Aerosol jet etching of fine patterns

Y. L. Chen, J. R. Brock, Isaac Trachtenberg · Applied Physics Letters · 1987 · 16 citations

, , +14

1–5 of 7

Authors

28

  1. SS
    Shoso Shingubara

    Kansai University, Japan

    1 publications · 33 citations

    1

    h-index

  2. CW
    C. W. Jurgensen

    AT&T (United States), United States

    1 publications · 117 citations

    1

    h-index

  3. YL
    Y. L. Chen

    The University of Texas at Austin, United States

    1 publications · 16 citations

    1

    h-index

  4. SB
    Sylvain Barraud

    Commissariat à l'Énergie Atomique et aux Énergies Alternatives, France

    1 publications · 12 citations

    1

    h-index

  5. YH
    Yasuhiro Horiike

    The University of Tokyo, Japan

    1 publications · 33 citations

    1

    h-index

1–5 of 28

Institutions

9

  1. Hiroshima University

    Hiroshima, Japan

    1 h-index

    5 publications

    165 citations

  2. STMicroelectronics (France)

    Montrouge, France

    1 h-index

    1 publications

    12 citations

  3. AT&T (United States)

    Bedminster, United States

    1 h-index

    2 publications

    234 citations

  4. Laboratoire d'Électronique des Technologies de l'Information

    Grenoble, France

    1 h-index

    10 publications

    120 citations

  5. Panasonic (Japan)

    Kadoma, Japan

    1 h-index

    3 publications

    33 citations

  6. The University of Texas at Austin

    Austin, United States

    1 h-index

    3 publications

    48 citations

  7. STMicroelectronics (Switzerland)

    Geneva, Switzerland

    1 h-index

    1 publications

    12 citations

  8. California Institute of Technology

    Pasadena, United States

    1 h-index

    2 publications

    48 citations

1–8 of 9

Venues

  1. Applied Physics Letters

    2 publications · 40 citations

    2

    h-index

  2. 1

    h-index

  3. 1

    h-index

  4. Journal of Applied Physics

    1 publications · 117 citations

    1

    h-index

  5. Thin Solid Films

    1 publications · 33 citations

    1

    h-index

1–5