Concepedia

Etch Mask Materials

Etch Mask Materials is a class of thin film materials selectively resistant to etching processes, used to protect underlying substrate regions during pattern transfer in microfabrication.

83

Publications

3.1K

Citations

400

Authors

126

Institutions

Publications per year

2017–2026

10

Parents

Publications

83

High-resolution electron-beam induced deposition

Hans W. P. Koops, R. Weiel, D. P. Kern et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1988 · 241 citations

, , +13

The black silicon method II:The effect of mask material and loading on the reactive ion etching of deep silicon trenches

Henri Jansen, M. de Boer, Johannes Faas Burger et al. · Microelectronic Engineering · 1995 · 150 citations · Full text

, , +15

Fabrication of nanoelectromechanical systems in single crystal silicon using silicon on insulator substrates and electron beam lithography

D. W. Carr, H. G. Craighead · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 149 citations

, , +17

Polylactide−Poly(dimethylsiloxane)−Polylactide Triblock Copolymers as Multifunctional Materials for Nanolithographic Applications

Marc D. Rodwogin, Charles S. Spanjers, Chris Leighton et al. · ACS Nano · 2010 · 133 citations

, , +14

Alumina etch masks for fabrication of high-aspect-ratio silicon micropillars and nanopillars

Michael David Henry, Sameer S. Walavalkar, Andrew Homyk et al. · Nanotechnology · 2009 · 125 citations

, , +16

1–5 of 83

Authors

400

  1. HY
    Huirong Yao

    Tianjin University of Technology, China

    2 publications · 36 citations

    2

    h-index

  2. ZA
    Z. Alam

    Rochester Institute of Technology, United States

    2 publications · 35 citations

    2

    h-index

  3. DS
    Douglas S. McKenzie

    SunEdison (United States), United States

    2 publications · 36 citations

    2

    h-index

  4. SJ
    S. J. Pearton

    University of Florida, United States

    2 publications · 52 citations

    2

    h-index

  5. AS
    Axel Scherer

    California Institute of Technology, United States

    2 publications · 135 citations

    2

    h-index

1–5 of 400

Institutions

126

  1. Tohoku University

    Sendai, Japan

    3 h-index

    9 publications

    97 citations

  2. Chinese Academy of Sciences

    Beijing, China

    3 h-index

    23 publications

    378 citations

  3. Centre National de la Recherche Scientifique

    Paris, France

    3 h-index

    6 publications

    156 citations

  4. Materials Processing (United States)

    Irving, United States

    2 h-index

    2 publications

    36 citations

  5. University of Florida

    Gainesville, United States

    2 h-index

    6 publications

    174 citations

  6. Samsung (South Korea)

    Seoul, South Korea

    2 h-index

    9 publications

    197 citations

  7. Seoul National University

    Seoul, South Korea

    2 h-index

    6 publications

    300 citations

  8. Rochester Institute of Technology

    Rochester, United States

    2 h-index

    10 publications

    175 citations

1–8 of 126

Venues

  1. 6

    h-index

  2. Journal of Micromechanics and Microengineering

    JMM · 5 publications · 231 citations

    5

    h-index

  3. Applied Physics Letters

    5 publications · 291 citations

    5

    h-index

  4. Journal of The Electrochemical Society

    JES · 5 publications · 126 citations

    5

    h-index

  5. 4

    h-index

1–5