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The black silicon method II:The effect of mask material and loading on the reactive ion etching of deep silicon trenches

Electrical EngineeringIon ImplantationEngineeringDeep Silicon TrenchesMicrofabricationSurface ScienceApplied PhysicsSemiconductor Device FabricationReactive Ion EtchingSilicon On InsulatorMicroelectronicsPlasma EtchingPlasma ProcessingMask Material