Electrostatic Integrity
Electrostatic Integrity is a metric in semiconductor device physics that quantifies the ability of a gate electrode to maintain full electrostatic control over the channel region in the presence of short-channel effects, thereby distinguishing it from other performance metrics by its specific focus on the gate's dominance over charge distribution and leakage mechanisms in scaled transistors.
66
Publications
2.7K
Citations
255
Authors
82
Institutions
Publications per year
2017–2026
17
66
Statistical variability and reliability in nanoscale FinFETs
Xingsheng Wang, A. R. Brown, B. Cheng et al. · 2011 · 274 citations
New structure transistors for advanced technology node CMOS ICs
Qingzhu Zhang, Yongkui Zhang, Yan-Na Luo et al. · National Science Review · 2024 · 139 citations · Full text
Engineering, Computer Engineering, Electrical Engineering +17
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82

National Yang Ming Chiao Tung University
Hsinchu, Taiwan
8 h-index
27 publications
508 citations
University of California, Berkeley
Berkeley, United States
5 h-index
17 publications
485 citations

Indian Institute of Technology Roorkee
Roorkee, India
4 h-index
12 publications
540 citations
Institute of Microelectronics
Beijing, China
4 h-index
15 publications
844 citations
Purdue University West Lafayette
West Lafayette, United States
4 h-index
15 publications
653 citations
IBM (United States)
Armonk, United States
4 h-index
13 publications
402 citations

University of Glasgow
Glasgow, United Kingdom
3 h-index
10 publications
1.3K citations

Chinese Academy of Sciences
Beijing, China
3 h-index
12 publications
730 citations
1–8 of 82
11 publications · 479 citations
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5 publications · 147 citations
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3 publications · 91 citations
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3 publications · 237 citations
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2 publications · 89 citations
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