Electrostatic Integrity

Electrostatic Integrity is a metric in semiconductor device physics that quantifies the ability of a gate electrode to maintain full electrostatic control over the channel region in the presence of short-channel effects, thereby distinguishing it from other performance metrics by its specific focus on the gate's dominance over charge distribution and leakage mechanisms in scaled transistors.

66

Publications

2.7K

Citations

255

Authors

82

Institutions

Publications per year

2017–2026

17

Authors

255

  1. PS
    Pin Su

    National Yang Ming Chiao Tung University, Taiwan

    6 publications · 120 citations

    6

    h-index

  2. TK
    Tsu‐Jae King Liu

    University of California, Berkeley, United States

    5 publications · 131 citations

    5

    h-index

  3. VP
    Vita Pi‐Ho Hu

    National Yang Ming Chiao Tung University, Taiwan

    4 publications · 59 citations

    4

    h-index

  4. DC
    Daniel Connelly

    Acorn, United States

    4 publications · 117 citations

    4

    h-index

  5. SD
    Sudeb Dasgupta

    Indian Institute of Technology Roorkee, India

    4 publications · 180 citations

    4

    h-index

1–5 of 255

Venues

  1. IEEE Transactions on Electron Devices

    11 publications · 479 citations

    11

    h-index

  2. IEEE Transactions on Nanotechnology

    5 publications · 147 citations

    5

    h-index

  3. IEEE Journal of the Electron Devices Society

    3 publications · 91 citations

    3

    h-index

  4. IEEE Electron Device Letters

    3 publications · 237 citations

    3

    h-index

  5. Scientific Reports

    2 publications · 89 citations

    2

    h-index

1–5