Concepedia

Electrical Resistivity Reduction

Electrical Resistivity Reduction is a materials engineering phenomenon in which the electrical resistance of a thin film decreases as a result of structural and compositional modifications induced by annealing processes.

487

Publications

17.7K

Citations

2.1K

Authors

611

Institutions

Publications per year

2017–2026

104

Parents

Publications

487

Resistivity of chemical vapor deposited diamond films

M. I. Landstrass, K. V. Ravi · Applied Physics Letters · 1989 · 499 citations

, , +15

Alteration of Cu conductivity in the size effect regime

S. M. Rossnagel, T. S. Kuan · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 452 citations

, , +17

Mechanisms for microstructure evolution in electroplated copper thin films near room temperature

J. M. E. Harper, C. Cabral, P. C. Andricacos et al. · Journal of Applied Physics · 1999 · 359 citations

, , +17

Nanostructured AgPb<i><sub>m</sub></i>SbTe<i><sub>m</sub></i><sub>+2</sub>System Bulk Materials with Enhanced Thermoelectric Performance

Min Zhou, Jing‐Feng Li, Takuji Kita · Journal of the American Chemical Society · 2008 · 340 citations

, , +16

Traversing the Metal‐Insulator Transition in a Zintl Phase: Rational Enhancement of Thermoelectric Efficiency in Yb<sub>14</sub>Mn<sub>1−<i>x</i></sub>Al<sub>x</sub>Sb<sub>11</sub>

Eric S. Toberer, Catherine A. Cox, Shawna R. Brown et al. · Advanced Functional Materials · 2008 · 328 citations

, , +17

1–5 of 487

Authors

2.1K

  1. SM
    S. M. Rossnagel

    IBM Research - Thomas J. Watson Research Center, United States

    4 publications · 623 citations

    4

    h-index

  2. BL
    Bo Liu

    Chinese Academy of Sciences, China

    4 publications · 183 citations

    4

    h-index

  3. SF
    Songlin Feng

    Shanghai Institute of Microsystem and Information Technology, China

    4 publications · 183 citations

    4

    h-index

  4. BC
    Bomy Chen

    Silicon Labs (United States), United States

    4 publications · 183 citations

    4

    h-index

  5. DC
    D.D.L. Chung

    University at Buffalo, State University of New York, United States

    3 publications · 96 citations

    3

    h-index

1–5 of 2.1K

Institutions

611

  1. Chinese Academy of Sciences

    Beijing, China

    13 h-index

    91 publications

    3.3K citations

  2. IBM (United States)

    Armonk, United States

    12 h-index

    52 publications

    1.4K citations

  3. Centre National de la Recherche Scientifique

    Paris, France

    10 h-index

    37 publications

    1.1K citations

  4. Tohoku University

    Sendai, Japan

    8 h-index

    23 publications

    1.1K citations

  5. The University of Osaka

    Osaka, Japan

    7 h-index

    17 publications

    666 citations

  6. Korea Advanced Institute of Science and Technology

    Daejeon, South Korea

    7 h-index

    17 publications

    429 citations

  7. Seoul National University

    Seoul, South Korea

    7 h-index

    28 publications

    835 citations

  8. The University of Tokyo

    Tokyo, Japan

    7 h-index

    23 publications

    682 citations

1–8 of 611

Venues

  1. Journal of Applied Physics

    40 publications · 1.8K citations

    23

    h-index

  2. Applied Physics Letters

    31 publications · 1.6K citations

    21

    h-index

  3. Thin Solid Films

    29 publications · 874 citations

    17

    h-index

  4. Journal of The Electrochemical Society

    JES · 13 publications · 584 citations

    13

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 13 publications · 330 citations

    11

    h-index

1–5