Defect Annealing

Defect Annealing is a materials processing technique that belongs to the class of thermal treatment methods, distinguished by its specific application to reduce or eliminate electronic defects in semiconductors through controlled heating and cooling cycles that promote defect recombination or migration to energetically favorable sites.

278

Publications

8.9K

Citations

967

Authors

333

Institutions

Publications per year

2017–2026

20

Authors

967

  1. AU
    Akira Uedono

    University of Tsukuba, Japan

    5 publications · 114 citations

    5

    h-index

  2. JC
    J. C. Bourgoin

    Université Paris Cité, France

    5 publications · 239 citations

    5

    h-index

  3. WJ
    William J. Weber

    Pacific Northwest National Laboratory, United States

    5 publications · 170 citations

    5

    h-index

  4. EJ
    Erik Janzén

    Linköping University, Sweden

    4 publications · 107 citations

    4

    h-index

  5. RA
    R. A. B. Devine

    Orange (France), France

    4 publications · 84 citations

    4

    h-index

1–5 of 967

Venues

  1. Applied Physics Letters

    25 publications · 1.3K citations

    17

    h-index

  2. Journal of Applied Physics

    28 publications · 1.1K citations

    16

    h-index

  3. Physical review. B, Condensed matter

    PRB · 14 publications · 637 citations

    13

    h-index

  4. 11

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 10 publications · 196 citations

    10

    h-index

1–5