Crystallographic Etching

Crystallographic Etching is a micromachining technique that selectively removes material from a crystalline substrate by exploiting the anisotropic etch rates inherent to different crystallographic planes, thereby enabling precise, geometry-controlled fabrication of microstructures.

63

Publications

3K

Citations

225

Authors

84

Institutions

Publications per year

2017–2026

4

Authors

225

  1. JM
    Joan M. Redwing

    Pennsylvania State University, United States

    2 publications · 238 citations

    2

    h-index

  2. DF
    Daniel Flamm

    Friedrich Schiller University Jena, Germany

    2 publications · 143 citations

    2

    h-index

  3. KA
    Kazuo Asaumi

    Nagoya University, Japan

    2 publications · 163 citations

    2

    h-index

  4. YB
    Ylva Bäcklund

    Uppsala University, Sweden

    2 publications · 108 citations

    2

    h-index

  5. MS
    Mitsuhiro Shikida

    Nagoya University, Japan

    2 publications · 163 citations

    2

    h-index

1–5 of 225

Venues

  1. Journal of The Electrochemical Society

    JES · 7 publications · 289 citations

    7

    h-index

  2. Journal of Applied Physics

    6 publications · 193 citations

    6

    h-index

  3. Applied Physics Letters

    4 publications · 338 citations

    4

    h-index

  4. Journal of Micromechanics and Microengineering

    JMM · 2 publications · 108 citations

    2

    h-index

  5. physica status solidi (a)

    2 publications · 36 citations

    2

    h-index

1–5