Copper Electroless Plating

Copper Electroless Plating is a chemical deposition process, belonging to the class of electroless plating techniques, that selectively deposits a coherent metallic copper layer onto a substrate through autocatalytic reduction of copper ions in solution without the application of external electrical current.

910

Publications

29.5K

Citations

3K

Authors

680

Institutions

Publications per year

2017–2026

206

Authors

3K

  1. ET
    E. T. Kang

    National University of Singapore, Singapore

    17 publications · 760 citations

    14

    h-index

  2. ZW
    Zenglin Wang

    Shaanxi Normal University, China

    18 publications · 503 citations

    14

    h-index

  3. KG
    K. G. Neoh

    National University of Singapore, Singapore

    15 publications · 636 citations

    12

    h-index

  4. YL
    Yinxiang Lu

    Fudan University, China

    11 publications · 358 citations

    11

    h-index

  5. YO
    Y. Okinaka

    Waseda University, Japan

    11 publications · 562 citations

    11

    h-index

1–5 of 3K

Venues

  1. Journal of The Electrochemical Society

    JES · 121 publications · 3.8K citations

    39

    h-index

  2. Applied Surface Science

    50 publications · 2K citations

    29

    h-index

  3. Surface and Coatings Technology

    52 publications · 1.9K citations

    25

    h-index

  4. Journal of Alloys and Compounds

    21 publications · 749 citations

    18

    h-index

  5. Electrochimica Acta

    24 publications · 803 citations

    17

    h-index

1–5