Copper Electroless Plating
Copper Electroless Plating is a chemical deposition process, belonging to the class of electroless plating techniques, that selectively deposits a coherent metallic copper layer onto a substrate through autocatalytic reduction of copper ions in solution without the application of external electrical current.
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29.5K
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3K
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680
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2017–2026
206
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910
Electroless copper deposition for ULSI
Yosi Shacham‐Diamand, Valery M. Dubin, M. Angyal · Thin Solid Films · 1995 · 224 citations · Full text
Natural Sciences, Electrical Engineering, Materials Science +17
Reduced electromigration of Cu wires by surface coating
C.‐K. Hu, Lynne Gignac, R. Rosenberg et al. · Applied Physics Letters · 2002 · 215 citations
Natural Sciences, Electrical Engineering, Materials Engineering +17
Shi Bai, Daniela Serien, Anming Hu et al. · Advanced Functional Materials · 2018 · 192 citations
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680
National Tsing Hua University
Hsinchu, Taiwan
17 h-index
81 publications
2.5K citations
National University of Singapore
Singapore, Singapore
16 h-index
66 publications
2.7K citations

Hefei University of Technology
Hefei, China
15 h-index
73 publications
2.2K citations
Georgia Institute of Technology
Atlanta, United States
15 h-index
67 publications
2.3K citations
Seoul National University
Seoul, South Korea
14 h-index
44 publications
1.8K citations

Sichuan University
Chengdu, China
13 h-index
41 publications
1.5K citations

Chinese Academy of Sciences
Beijing, China
13 h-index
35 publications
832 citations

Shaanxi Normal University
Xi'an, China
13 h-index
56 publications
1.2K citations
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JES · 121 publications · 3.8K citations
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50 publications · 2K citations
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52 publications · 1.9K citations
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21 publications · 749 citations
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