K. Holloway

Statistics

Publications

Citations

297

H-Index

Active since

1988

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

K. Holloway is an author at IBM Research - Thomas J. Watson Research Center specializing in materials science, natural sciences, and electronic materials.

Publications per year

1988–2003

Publications

Comparison of high vacuum and ultra-high-vacuum tantalum diffusion barrier performance against copper penetration

L. A. Clevenger, N. A. Bojarczuk, K. Holloway et al. · Journal of Applied Physics · 1993 · 108 citations

Natural Sciences, Materials Engineering, Materials Science +17

The development of<i>in situ</i>high-resolution electron microscopy

Ryan Sinclair, Tatsuya Yamashita, M. A. Parker et al. · Acta Crystallographica Section A Foundations of Crystallography · 1988 · 70 citations

Engineering, Materials Science, Physics +14

Preparation of low resistivity Cu–1 at. %Cr thin films by magnetron sputtering

C. Cabral, J. M. E. Harper, K. Holloway et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 47 citations

Natural Sciences, Electrical Engineering, Materials Science +17

Ultraclean, integrated processing of thermal oxide structures

M. Offenberg, M. Liehr, Gary W. Rubloff et al. · Applied Physics Letters · 1990 · 39 citations

Natural Sciences, Materials Engineering, Materials Science +17

Tantalum, tantalum nitride, and chromium adhesion to polyimide: effect of annealing ambient on adhesion

L.P. Buchwalter, K. Holloway · Journal of Adhesion Science and Technology · 1998 · 20 citations

Natural Sciences, Materials Engineering, Materials Science +17

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