First generation laser-produced plasma source system for HVM EUV lithography

Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, +11

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringEngineeringHigh SpeedLaser Plasma PhysicsHvm Euv Lithography +12

Laser produced EUV light source development for HVM

Akira Endo, Hideo Hoshino, Takashi Suganuma, +11

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringLaser ScienceLaser-plasma InteractionLaser PhysicsLaser Applications +16

Laser-produced-plasma light source development for extreme ultraviolet lithography

Hiroshi Komori, Tamotsu Abe, Takashi Suganuma, +10

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Extreme Ultraviolet LithographyEngineeringLaser Plasma PhysicsLaser-induced BreakdownConversion Efficiency +13

Characterization of various Sn targets with respect to debris and fast ion generation

Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, +8

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringTarget FabricationLaser ApplicationsHigh-power LasersLaser Control +23

Magnetic field ion mitigation for EUV light sources

Hiroshi Komori, Yousuke Imai, Georg Soumagne, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringEngineeringPhysicsCollector MirrorApplied Physics +10

Quenching and recovery spectra of midgap levels (EL2) in semi-insulating GaAs measured by double-beam photoconductivity

T. Hariu, Tomoru Sato, Hiroshi Komori, +1

Journal of Applied Physics

Optical MaterialsEngineeringMidgap Donor LevelsIi-vi SemiconductorOptical Properties +15

<title>High-power KrF excimer laser with a solid state switch for microlithography</title>

Hakaru Mizoguchi, Noritoshi Ito, Hiroaki Nakarai, +7

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringNew KrfHigh-power Laser TechnologyPower CircuitLaser Science +21

Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, +11

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringLaser ScienceLaser-plasma InteractionLaser Applications +18

Ion damage analysis on EUV collector mirrors

Hiroshi Komori, Georg Soumagne, Hideo Hoshino, +5

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringIon ImplantationEngineeringIon Damage AnalysisPhysics +12

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, +21

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringEngineeringLaser Plasma PhysicsEuv LithographyTin Vapor Evacuation +11