Laser produced EUV light source development for HVM

Akira Endo, Hideo Hoshino, Takashi Suganuma, +11

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringLaser ScienceLaser-plasma InteractionLaser PhysicsLaser Applications +16

Laser-produced-plasma light source development for extreme ultraviolet lithography

Hiroshi Komori, Tamotsu Abe, Takashi Suganuma, +10

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Extreme Ultraviolet LithographyEngineeringLaser Plasma PhysicsLaser-induced BreakdownConversion Efficiency +13

LPP EUV light source employing high power C0 2 laser

Hideo Hoshino, Takashi Suganuma, Takeshi Asayama, +5

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringLaser ScienceLaser-plasma InteractionLaser ApplicationsLaser Physics +15

EUV radiation characteristics of a CO2 laser produced Xe plasma

H. Komori, Yoshifumi Ueno, Hideo Hoshino, +4

Applied Physics B

Plasma ApplicationLaser-plasma InteractionLaser Plasma PhysicEuv Radiation Characteristics

Characterization of various Sn targets with respect to debris and fast ion generation

Yoshifumi Ueno, Hideo Hoshino, Tatsuya Ariga, +8

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringTarget FabricationLaser ApplicationsHigh-power LasersLaser Control +23

Laser-produced-plasma light source for EUV lithography

Georg Soumagne, Tamotsu Abe, Takashi Suganuma, +11

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringLaser ScienceLaser-plasma InteractionLaser Applications +18

Ion damage analysis on EUV collector mirrors

Hiroshi Komori, Georg Soumagne, Hideo Hoshino, +5

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringIon ImplantationEngineeringIon Damage AnalysisPhysics +12

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno, +21

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringEngineeringLaser Plasma PhysicsEuv LithographyTin Vapor Evacuation +11

CO 2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography

Akira Endo, Tamotsu Abe, Hideo Hoshino, +8

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE