Takeshi Asayama

Laser produced EUV light source development for HVM

Akira Endo, Hideo Hoshino, Takashi Suganuma et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 41 citations

Engineering, Laser Science, Laser-plasma Interaction +18

LPP EUV light source employing high power C0 2 laser

Hideo Hoshino, Takashi Suganuma, Takeshi Asayama et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 24 citations

Engineering, Laser Science, Laser-plasma Interaction +17

Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography

Takeshi Asayama, Youichi Sasaki, Takayuki Nagashima et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 16 citations

Engineering, Laser Science, Electron-beam Lithography +17

Laser-produced plasma source development for EUV lithography

Akira Endo, Hiroshi Komori, Yoshifumi Ueno et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 13 citations

Electrical Engineering, Engineering, Laser Plasma Physics +13

CO 2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography

Akira Endo, Tamotsu Abe, Hideo Hoshino et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 12 citations