E. F. Krimmel

Implantation profiles modified by sputtering

E. F. Krimmel, H.-J. Pfleiderer · Radiation Effects · 1973 · 32 citations

Engineering, Materials Engineering, Materials Science +9

Hydrogen profiles of thin PVD silicon nitride films using elastic recoil detection analysis

A. Markwitz, Michael Bachmann, H. Baumann et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1992 · 30 citations

Natural Sciences, Materials Engineering, Materials Science +12

In situ detection of rearrangement processes during electron beam annealing of ion implanted InP

Christian Maurer, R. Kallweit, H. Baumann et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1993 · 29 citations

Engineering, Materials Engineering, Materials Science +6

Chemical bonding and interface analysis of ultrathin silicon-nitride layers produced by ion implantation and Electron Beam Rapid Thermal Annealing (EB-RTA)

A. Markwitz, H. Baumann, E. F. Krimmel et al. · Applied Physics A · 1994 · 28 citations

Engineering, Materials Engineering, Materials Science +17

Investigations of ultrathin silicon nitride layers produced by low-energy ion implantation and EB-RTA

A. Markwitz, H. Baumann, Wolfgang Grill et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1994 · 27 citations

Engineering, Materials Engineering, Materials Science +13