Radiation Effects · 1973 · 32 citations · 3 references
EngineeringMaterials EngineeringMaterials ScienceImpurity ProfilingIon ImplantationImplantation Profile ModelingIon Implantation EffectsIon Implantation SimulationSaturationSputteringSputtering EffectsSputtering Processes
Abstract The impurity profiles obtained by ion implantation may be seriously affected by simultaneous sputtering, Saturation conditions are easily achievable in the case of sufficient sputtering yield. A numerical study is made on the basis of a previous model using a simple penetration distribution function. The accordance with experimental results is promising.
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Ion Sorption in the Presence of Sputtering
G Carter, J.S. Colligon, J H Leck · Proceedings of the Physical Society · 1962 · 72 citations