Investigations of ultrathin silicon nitride layers produced by low-energy ion implantation and EB-RTA - Concepedia

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Investigations of ultrathin silicon nitride layers produced by low-energy ion implantation and EB-RTA

27

Citations

12

References

1994

Year

A. Markwitz, H. Baumann, Wolfgang Grill, A. Knop, E. F. Krimmel

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

Materials ScienceIon ImplantationEngineeringUltrathin SiliconApplied PhysicsSemiconductor Device FabricationSilicon On InsulatorLow-energy Ion ImplantationSemiconductor Device

References

	Year	Citations

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