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Chemical bonding and interface analysis of ultrathin silicon-nitride layers produced by ion implantation and Electron Beam Rapid Thermal Annealing (EB-RTA)

Materials EngineeringMaterials ScienceIon ImplantationEngineeringNanoelectronicsApplied PhysicsChemical BondingSemiconductor MaterialSemiconductor Device FabricationInterface AnalysisSilicon On InsulatorMicroelectronics