Shazia Yasin - Concepedia

Author

Shazia Yasin

University of Cambridge

Also Known As

S YASIN, S. Z. M. Yasin, S.Z.M. Yasin, Shazia Yasin

Publications

654

Citations

H-Index

Concepts

All Affiliations

University of Cambridge Cambridge Microelectronics (United Kingdom)University of Oxford Centre National de la Recherche Scientifique

About

Shazia Yasin is an author at University of Cambridge specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	12	12	614
2	Applied Physics	11	11	602
3	Chemical Engineering	2	2	32
4	Natural Sciences	1	1	19
5	Chemistry	1	1	19

Shazia Yasin

Publications

614

Citations

H-Index

Page 1

	Year	Citations
Fabrication of &lt;5 nm width lines in poly(methylmethacrylate) resist using a water:isopropyl alcohol developer and ultrasonically-assisted development Shazia Yasin, D. G. Hasko, H. Ahmed Applied Physics Letters EngineeringElectron-beam LithographyResponsive PolymersSolvent SystemPolymers	2001	163
InGaN quantum dots grown by metalorganic vapor phase epitaxy employing a post-growth nitrogen anneal Rachel A. Oliver, G. Andrew D. Briggs, Menno J. Kappers, Applied Physics Letters EngineeringGan Buffer LayerSemiconductor NanostructuresSemiconductorsIi-vi Semiconductor	2003	140
Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography Shazia Yasin, D. G. Hasko, H. Ahmed Microelectronic Engineering Materials ScienceElectron Beam NanolithographyEngineeringElectron-beam LithographyBeam Lithography	2002	110
Influence of developer and development conditions on the behavior of high molecular weight electron beam resists D. G. Hasko, Shazia Yasin, Asim Mumtaz Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMechanical EngineeringElectron DiffractionDevelopment Conditions	2000	47
Nanolithography using ultrasonically assisted development of calixarene negative electron beam resist Shazia Yasin, Daniel Haško, F. Carecenac Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyElectron MicroscopyBeam Lithography	2001	31
Influence of polymer phase separation on roughness of resist features Shazia Yasin, D. G. Hasko, M. N. Khalid, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials EngineeringMaterials SciencePolymer ChemistryPolymer Phase SeparationAtomic Force Microscopy	2004	27
Biexciton and exciton dynamics in single InGaN quantum dots James H. Rice, J. W. Robinson, Jong H. Na, Nanotechnology Localized Excited StateEngineeringExcitation Energy TransferBiexciton TransitionsLuminescence Property	2005	24
Comparison of sensitivity and exposure latitude for polymethylmethacrylate, UVIII, and calixarene using conventional dip and ultrasonically assisted development Shazia Yasin, D. G. Hasko, H. Ahmed Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyChemistryExposure LatitudeChemical Engineering	1999	19
Characterisation of the ultrasonic development process in UVIII resist Shazia Yasin, Asim Mumtaz, D. G. Hasko, Microelectronic Engineering EngineeringApplied PhysicsUviii ResistUltrasoundAcoustic Cavitation	2000	15
Correlation of surface roughness with edge roughness in PMMA resist Shazia Yasin, M. N. Khalid, D. G. Hasko, Microelectronic Engineering EngineeringResistorSpecific ResistanceMechanical EngineeringApplied Physics	2005	13

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