Shazia Yasin

Fabrication of <5 nm width lines in poly(methylmethacrylate) resist using a water:isopropyl alcohol developer and ultrasonically-assisted development

Shazia Yasin, D. G. Hasko, H. Ahmed · Applied Physics Letters · 2001 · 163 citations

Engineering, Electron-beam Lithography, Responsive Polymers +21

InGaN quantum dots grown by metalorganic vapor phase epitaxy employing a post-growth nitrogen anneal

Rachel A. Oliver, G. Andrew D. Briggs, Menno J. Kappers et al. · Applied Physics Letters · 2003 · 140 citations

Engineering, Gan Buffer Layer, Semiconductor Nanostructures +19

Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography

Shazia Yasin, D. G. Hasko, H. Ahmed · Microelectronic Engineering · 2002 · 110 citations

Materials Science, Electron Beam Nanolithography, Engineering +12

Influence of developer and development conditions on the behavior of high molecular weight electron beam resists

D. G. Hasko, Shazia Yasin, Asim Mumtaz · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 47 citations

Engineering, Electron-beam Lithography, Mechanical Engineering +18

Nanolithography using ultrasonically assisted development of calixarene negative electron beam resist

Shazia Yasin, Daniel Haško, F. Carecenac · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 31 citations

Engineering, Electron-beam Lithography, Microscopy +16