S. Fang - Concepedia

Author

S. Fang

Stanford University

Also Known As

S. Fang, S. J. Fang, S.J. Fang, Saicheng Fang

Publications

720

Citations

H-Index

Concepts

All Affiliations

Stanford University Stanford SystemX Alliance Texas Instruments (United States)Integrated Systems Solutions (United States)Hitachi (United Kingdom)

About

S. Fang is an author at Stanford University specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	12	13	708
2	Applied Physics	10	10	667
3	Medicine	1	1	147
4	Civil Engineering	1	1	88
5	Computer Engineering	1	1	11

S. Fang

Publications

708

Citations

H-Index

Page 1

	Year	Citations
Analyzing atomic force microscopy images using spectral methods S. Fang, S. Haplepete, W. Chen, Journal of Applied Physics Typical AfmEngineeringMicroscopyMeasurementUtilizing Spectral Analysis	1997	147
Thin-oxide damage from gate charging during plasma processing S. Fang, J.P. McVittie IEEE Electron Device Letters Electrical EngineeringPlasma ElectronicsEngineeringPhysicsGlow Discharge	1992	146
Correlation between inversion layer mobility and surface roughness measured by AFM Toshiaki Yamanaka, S. Fang, Heng-Chih Lin, IEEE Electron Device Letters Surface CharacterizationElectrical EngineeringEngineeringMicrofabricationNanoelectronics	1996	88
A model and experiments for thin oxide damage from wafer charging in magnetron plasmas S. Fang, J.P. McVittie IEEE Electron Device Letters EngineeringPlasma SciencePlasma PhysicsThin Oxide DamagePlasma Electronics	1992	80
Comparison of Si surface roughness measured by atomic force microscopy and ellipsometry S. Fang, W. Chen, Toshiaki Yamanaka, Applied Physics Letters Materials ScienceAtomic Force MicroscopySurface CharacterizationSame Rms RoughnessEllipsometric Paramter δ	1996	69
Modeling of oxide breakdown from gate charging during resist ashing S. Fang, Shigemi Murakawa, J.P. McVittie IEEE Transactions on Electron Devices EngineeringAntenna Capacitor StructurePlasma SciencePlasma PhysicsPlasma Electronics	1994	53
Influence of Interface Roughness on Silicon Oxide Thickness Measured by Ellipsometry S. Fang, W. Chen, T. Yamanaka, Journal of The Electrochemical Society EngineeringSilicon On InsulatorUltrathin FilmsInterface RoughnessThin Film Processing	1997	31
The Evolution of (001) Si / SiO2 Interface Roughness during Thermal Oxidation S. Fang, W. Chen, T. Yamanaka, Journal of The Electrochemical Society EngineeringMicroscopyOxidation ResistanceThermal OxidationSilicon On Insulator	1997	27
Asymptotic Analysis of the Modes of Wave Propagation in a Solid Cylinder J. D. Achenbach, S. Fang The Journal of the Acoustical Society of America EngineeringSurface WaveStructural DynamicsMechanical EngineeringWave Motion	1970	16
A study of within-wafer non-uniformity metrics T. Smith, Duane S. Boning, S. Fang, Materials ScienceWithin-wafer NonuniformityMultiple MetricsEngineeringAdvanced Packaging (Semiconductors)	2003	14

Page 1