S. Fang

Analyzing atomic force microscopy images using spectral methods

S. Fang, S. Haplepete, W. Chen et al. · Journal of Applied Physics · 1997 · 147 citations

Typical Afm, Engineering, Microscopy +16

Thin-oxide damage from gate charging during plasma processing

S. Fang, J.P. McVittie · IEEE Electron Device Letters · 1992 · 146 citations

Electrical Engineering, Plasma Electronics, Engineering +15

Correlation between inversion layer mobility and surface roughness measured by AFM

Toshiaki Yamanaka, S. Fang, Heng-Chih Lin et al. · IEEE Electron Device Letters · 1996 · 88 citations

Surface Characterization, Electrical Engineering, Engineering +14

A model and experiments for thin oxide damage from wafer charging in magnetron plasmas

S. Fang, J.P. McVittie · IEEE Electron Device Letters · 1992 · 80 citations

Engineering, Plasma Science, Plasma Physics +16

Comparison of Si surface roughness measured by atomic force microscopy and ellipsometry

S. Fang, W. Chen, Toshiaki Yamanaka et al. · Applied Physics Letters · 1996 · 69 citations

Materials Science, Atomic Force Microscopy, Surface Characterization +13