Comparison of Si surface roughness measured by atomic force microscopy and ellipsometry

Abstract

Measurements of Si surface roughness by atomic force microscopy and ellipsometry have been performed over a wide range of conditions. Advanced methods of data analysis have been applied to both techniques leading to a quantitative comparison of root-mean-square (rms) roughness to the ellipsometric paramter Δ. Differences in Δ are observed for surfaces with the same rms roughness, but different roughness spectral densities, as expected from theory.