Y. Shusterman

Epitaxial growth of AlN and Al0.5Ga0.5N layers on aluminum nitride substrates

L. J. Schowalter, Y. Shusterman, R. Wang et al. · Applied Physics Letters · 2000 · 49 citations

Engineering, Materials Engineering, Materials Science +16

Low-k interconnect stack with metal-insulator-metal capacitors for 22nm high volume manufacturing

D. Ingerly, Ankur Agrawal, Ricardo Ascázubi et al. · 2012 · 49 citations

Engineering, Materials Engineering, Materials Science +13

Low-k interconnect stack with a novel self-aligned via patterning process for 32nm high volume manufacturing

R. Brain, S. Agrawal, D. Becher et al. · 2009 · 34 citations

Engineering, Electrical Engineering, Materials Science +17

Epitaxial growth of AlN and Al0.5Ga0.5N layers on aluminum nitride substrates

L. J. Schowalter, J. Carlos Rojo, Glen A. Slack et al. · Journal of Crystal Growth · 2000 · 25 citations

Engineering, Materials Engineering, Materials Science +16

Characterization and challenge of TDDB reliability in Cu/low K dielectric interconnect

Xia Feng, Jun He, Prad Prabhumirashi et al. · 2011 · 10 citations

Engineering, Electrical Engineering, Materials Engineering +17