Aaron Thean

Heteroepitaxy of InP on Si(001) by selective-area metal organic vapor-phase epitaxy in sub-50 nm width trenches: The role of the nucleation layer and the recess engineering

Clément Merckling, Niamh Waldron, Shidong Jiang et al. · Journal of Applied Physics · 2014 · 88 citations · Full text

Engineering, Materials Engineering, Materials Science +17

Polarity control in WSe2 double-gate transistors

Giovanni V. Resta, Surajit Sutar, Yashwanth Balaji et al. · Scientific Reports · 2016 · 84 citations · Full text

Engineering, Materials Science, Physics +17

Scaling of 32nm low power SRAM with high-K metal gate

Haining Yang, Robert Wong, R. Hasumi et al. · 2008 · 50 citations

Engineering, Computer Engineering, Electrical Engineering +16

(Invited) Vertical Nanowire FET Integration and Device Aspects

A. Veloso, Efrain Altamirano Sánchez, S. Brus et al. · ECS Transactions · 2016 · 49 citations

Engineering, Computer Engineering, Electrical Engineering +17

Three-dimensional self-consistent simulation of the charging time response in silicon nanocrystal flash memories

J. S. de Sousa, Aaron Thean, Jean‐Pierre Leburton et al. · Journal of Applied Physics · 2002 · 45 citations

Natural Sciences, Materials Science, Physics +17