Shou-ichi Uchino - Concepedia

Author

Shou-ichi Uchino

Also Known As

S. UCHINO, S. Uchino, SHOUICHI UCHINO, Shou-ichi Uchino, Shou-ichi Uchino Shou-ichi Uchino, Shouichi Uchino, Shou‐Ichi Uchino

Publications

177

Citations

H-Index

Concepts

All Affiliations

Hitachi (Japan)

About

Shou-ichi Uchino is an author at Hitachi (Japan) specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	95
2	Applied Physics	4	4	69
3	Medicine	1	1	12
4	Biomedical Engineering	1	1	12
5	Chemical Engineering	1	1	14

Shou-ichi Uchino

Publications

Citations

H-Index

Page 1

	Year	Citations
Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process Toshihiko Tanaka, Mitsuaki Morigami, Hiroaki Oizumi, Japanese Journal of Applied Physics Materials ScienceEngineeringResist Pattern CollapseResistorSpecific Resistance	1994	24
A Novel Optical Lithography Technique Using the Phase-Shifter Fringe Toshihiko Tanaka, Shou-ichi Uchino, Norio Hasegawa, Japanese Journal of Applied Physics Optical MaterialsEngineeringMicroscopyOptical MetrologyPattern Transfer	1991	20
Negative electron-beam nanofabrication resist using acid-catalyzed protection of polyphenol provided by phenylcarbinol Shou-ichi Uchino, Jiro Yamamoto, Sonoko Migitaka, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyOrganic ElectronicsChemistryBest Protection Reagent	1998	14
Nanometer Electron Beam Lithography with Azide-Phenolic Resin Resist Systems Jiro Yamamoto, Shou-ichi Uchino, Takashi Hattori, Japanese Journal of Applied Physics Aromatic AzideEngineeringElectron-beam LithographyNanodevicesOptoelectronic Devices	1996	13
Accurate critical dimension control by using an azide/novolak resist process for electron-beam lithography Jiro Yamamoto, Shou-ichi Uchino, Hiroya Ohta, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyNanodevicesTarget FabricationWafer Scale Processing	1997	12
Azide–novolak resin negative photoresist for <i>i</i>-line phase-shifting lithography Shou-ichi Uchino, Toshihiko Tanaka, Takumi Ueno, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceNovolak ResinOptical MaterialsEngineeringNegative Photoresist	1991	12

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