Toshihisa Nozawa

The Electron Charging Effects of Plasma on Notch Profile Defects

Toshihisa Nozawa, Takashi Kinoshita, Tetsuya Nishizuka et al. · Japanese Journal of Applied Physics · 1995 · 120 citations

Engineering, Electrical Engineering, Materials Science +15

Atomic layer etching of SiO2 by alternating an O2 plasma with fluorocarbon film deposition

Takayoshi Tsutsumi, Hiroki Kondo, Masaru Hori et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 54 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Damage mechanism in low-dielectric (low-k) films during plasma processes

Butsurin Jinnai, Toshihisa Nozawa, Seiji Samukawa · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 46 citations

Natural Sciences, Materials Engineering, Materials Science +17

Non-porous ultra-low-<i>k</i>SiOCH (<i>k</i>= 2.3) for damage-free integration and Cu diffusion barrier

Yoshiyuki Kikuchi, Akira Wada, Takuya Kurotori et al. · Journal of Physics D Applied Physics · 2013 · 19 citations

Natural Sciences, Materials Engineering, Materials Science +17

Characterization of CO2 plasma ashing for less low-dielectric-constant film damage

Yoshio Susa, Hiroto Ohtake, Zhao Jianping et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 13 citations

Natural Sciences, Materials Engineering, Materials Science +15