Concepedia

Tetsuya Nishizuka

TN

Statistics

Publications

4

Citations

171

H-Index

4

Active since

1995

Affiliations

Tokyo Electron (Japan)(Current)

Tetsuya Nishizuka is an author at Tokyo Electron (Japan) specializing in semiconductor devices, materials science, and engineering.

Publications per year

1995–2022

4

Publications

4

The Electron Charging Effects of Plasma on Notch Profile Defects

Toshihisa Nozawa, Takashi Kinoshita, Tetsuya Nishizuka et al. · Japanese Journal of Applied Physics · 1995 · 120 citations

Engineering, Electrical Engineering, Materials Science +15

Sub-100 nm InGaAs quantum-well (QW) tri-gate MOSFETs with Al<inf>2</inf>O<inf>3</inf>/HfO<inf>2</inf> (EOT &#x003C; 1 nm) for low-power logic applications

T.-W. Kim, Dong-Jo Kim, Donghyi Koh et al. · 2013 · 20 citations

Engineering, Electrical Engineering, Physics +11

Novel technology of high-aspect-ratio etch utilizing coverage-controllable atomic layer deposition

Sho Kumakura, Hironari Sasagawa, Tetsuya Nishizuka et al. · Japanese Journal of Applied Physics · 2022 · 18 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges

Angélique Raley, Lior Huli, Steven Grzeskowiak et al. · 2022 · 13 citations

Engineering, Materials Engineering, Materials Science +12

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