H. Shibata

Highly reliable copper dual-damascene interconnects with self-formed MnSi/sub x/O/sub y/ barrier Layer

T. Usui, H. Nasu, S. Takahashi et al. · IEEE Transactions on Electron Devices · 2006 · 82 citations

Materials Science, Engineering, Tunneling Microscopy +15

High performance 35 nm gate length CMOS with NO oxynitride gate dielectric and Ni salicide

S. Inaba, K. Okano, Shôichi Matsuda et al. · IEEE Transactions on Electron Devices · 2002 · 75 citations

Low-power Electronics, Nitrogen Concentration, Electrical Engineering +12

A 2-million-pixel CCD image sensor overlaid with an amorphous silicon photoconversion layer

Shiro Manabe, Y. Mastunaga, Akihiko Furukawa et al. · IEEE Transactions on Electron Devices · 1991 · 32 citations

Photonic Sensor, Electrical Engineering, Photoelectric Sensor +15

Use of gas as low-k interlayer dielectric in LSI's: Demonstration of feasibility

M.B. Anand, Masao Yamada, H. Shibata · IEEE Transactions on Electron Devices · 1997 · 29 citations

Low-k Interlayer Dielectric, Engineering, Wire Capacitance +19

Robust hermetic wafer level thin-film encapsulation technology for stacked MEMS / IC package

Yoshiaki Shimooka, M. Inoue, Masamori Endo et al. · 2008 · 21 citations

Engineering, Mechanical Engineering, Micro-electromechanical System +16